"Characteristcs of Ga-Doped ZnO Films Prepared by RF Magnetron Sputtering ..."

Koichi Muto et al. (2008)

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DOI: 10.1093/IETELE/E91-C.10.1649

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - https://dblp.org/rec/journals/ieicet/MutoONM08
Koichi Muto, Satoru Odashima, Norimitsu Nasu, Osamu Michikami:
Characteristcs of Ga-Doped ZnO Films Prepared by RF Magnetron Sputtering in Ar + H₂ Ambience. IEICE Trans. Electron. 91-C(10): 1649-1652 (2008)

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