"Numerical Analyses for Contact Resistance due to Constriction Effect of ..."

Shigeru Sawada et al. (2010)

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DOI: 10.1587/TRANSELE.E93.C.905

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type: Journal Article

metadata version: 2020-04-11

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Shigeru Sawada, Terutaka Tamai, Yasuhiro Hattori, Kazuo Iida:
Numerical Analyses for Contact Resistance due to Constriction Effect of Current Flowing through Multi-Spot Construction. IEICE Trans. Electron. 93-C(6): 905-911 (2010)

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