"Hydrogen Plasma Annealing of ZnO Films Deposited by Magnetron Sputtering ..."

Kanji Yasui et al. (2009)

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DOI: 10.1587/TRANSELE.E92.C.1438

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - https://dblp.org/rec/journals/ieicet/YasuiOKNTA09
Kanji Yasui, Yutaka Ooshima, Yuichiro Kuroki, Hiroshi Nishiyama, Masasuke Takata, Tadashi Akahane:
Hydrogen Plasma Annealing of ZnO Films Deposited by Magnetron Sputtering with Third Electrode. IEICE Trans. Electron. 92-C(12): 1438-1442 (2009)

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