"Kr-Plasma Sputtering for Pt Gate Electrode Deposition on MFSFET with 5 ..."

Joong-Won Shin, Masakazu Tanuma, Shun'ichiro Ohmi (2023)

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DOI: 10.1587/TRANSELE.2022FUP0003

access: closed

type: Journal Article

metadata version: 2023-10-23

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Joong-Won Shin, Masakazu Tanuma, Shun'ichiro Ohmi:
Kr-Plasma Sputtering for Pt Gate Electrode Deposition on MFSFET with 5 nm-Thick Ferroelectric Nondoped HfO₂ Gate Insulator for Analog Memory Application. IEICE Trans. Electron. 106(10): 581-587 (2023)

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