"Avoidance vs. repair: New approaches to increasing electromigration ..."

Steve Bigalke, Jens Lienig (2020)

> Home

Details and statistics

DOI: 10.1016/J.VLSI.2020.04.009

access: closed

type: Journal Article

metadata version: 2020-09-30

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/integration/BigalkeL20
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/integration/BigalkeL20
Steve Bigalke, Jens Lienig:
Avoidance vs. repair: New approaches to increasing electromigration robustness in VLSI routing. Integr. 75: 189-198 (2020)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.