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"Retina for pattern matching in standard 0.6-µm complementary metal ..."

Olivier Aubreton et al. (2004)

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DOI: 10.1117/1.1762886

access: closed

type: Journal Article

metadata version: 2021-10-14

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Olivier Aubreton, Benaissa Bellach, Lew Fock Chong Lew Yan Voon, Bernard Lamalle, Patrick Gorria, Guy Cathébras:
Retina for pattern matching in standard 0.6-µm complementary metal oxide semiconductor technology. J. Electronic Imaging 13(3): 559-569 (2004)

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