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"Scratch-concerned yield modeling for IC manufacturing involved with a ..."
Jiao-jiao Zhu et al. (2012)
- Jiao-jiao Zhu, Xiao-hua Luo, Li-sheng Chen, Yi Ye, Xiaolang Yan:
Scratch-concerned yield modeling for IC manufacturing involved with a chemical mechanical polishing process. J. Zhejiang Univ. Sci. C 13(5): 376-384 (2012)
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