"Effect of deposition rate and thickness on the structural and electrical ..."

M. Hemmous et al. (2008)

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DOI: 10.1016/J.MEJO.2008.03.005

access: closed

type: Journal Article

metadata version: 2021-08-11

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M. Hemmous, Abdelhamid Layadi, A. Guittoum, A. Bourzami, Abderrahim Benabbas:
Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and Ni/Si(1 0 0) thin films. Microelectron. J. 39(12): 1545-1549 (2008)

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