"Advanced etching of silicon based on deep reactive ion etching for silicon ..."

Frédéric Marty et al. (2005)

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DOI: 10.1016/J.MEJO.2005.04.039

access: closed

type: Journal Article

metadata version: 2023-08-19

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Frédéric Marty, Lionel Rousseau, Bassam Saadany, B. Mercier, Olivier Français, Y. Mita, Tarik Bourouina:
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. Microelectron. J. 36(7): 673-677 (2005)

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