"Fabrication of strained Si channel PMOSFET on thin relaxed ..."

Ding-Lei Mei et al. (2004)

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DOI: 10.1016/J.MEJO.2004.07.011

access: closed

type: Journal Article

metadata version: 2020-02-22

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Ding-Lei Mei, Jing-chun Li, Jing Zhang, Wan-jing Xu, Kaizhou Tan, Mo-hua Yang:
Fabrication of strained Si channel PMOSFET on thin relaxed Si_1-xGe_x virtual substrate. Microelectron. J. 35(12): 969-971 (2004)

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