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"Challenges and performance limitations of high-k and oxynitride gate ..."

S. Y. Tan (2007)

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DOI: 10.1016/J.MEJO.2007.04.012

access: closed

type: Journal Article

metadata version: 2020-02-22

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S. Y. Tan:
Challenges and performance limitations of high-k and oxynitride gate dielectrics for 90/65nm CMOS technology. Microelectron. J. 38(6-7): 783-786 (2007)

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