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"Study and improvement of electrical performance of 130 nm Cu/CVD low k ..."

C. F. Tsang, V. N. Bliznetsov, Y. J. Su (2003)

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DOI: 10.1016/J.MEJO.2003.09.005

access: closed

type: Journal Article

metadata version: 2020-02-22

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C. F. Tsang, V. N. Bliznetsov, Y. J. Su:
Study and improvement of electrical performance of 130 nm Cu/CVD low k SiOCH interconnect related to via etch process. Microelectron. J. 34(11): 1051-1058 (2003)

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