"Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies."

Fen Chen et al. (2008)

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DOI: 10.1016/J.MICROREL.2008.06.037

access: closed

type: Journal Article

metadata version: 2020-02-22

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Fen Chen, O. Bravo, Dave Harmon, Michael A. Shinosky, J. Aitken:
Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies. Microelectron. Reliab. 48(8-9): 1375-1383 (2008)

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