"Electrical characterization of HfO2 films obtained by UV ..."

J. M. Decams et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.023

access: closed

type: Journal Article

metadata version: 2021-08-27

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J. M. Decams, H. Guillon, Carmen Jiménez, M. Audier, J. P. Sénateur, C. Dubourdieu, O. Cadix, Barry J. O'Sullivan, Mircea Modreanu, Paul K. Hurley:
Electrical characterization of HfO₂ films obtained by UV assisted injection MOCVD. Microelectron. Reliab. 45(5-6): 929-932 (2005)

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