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"Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, ..."
Didier Goguenheim, D. Pic, Jean-Luc Ogier (2007)
- Didier Goguenheim, D. Pic, Jean-Luc Ogier:
Oxide reliability below 3 nm for advanced CMOS: Issues, characterization, and solutions. Microelectron. Reliab. 47(9-11): 1322-1329 (2007)
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