"Mechanism of gate dielectric degradation by hydrogen migration from the ..."

Yusuke Higashi et al. (2017)

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DOI: 10.1016/J.MICROREL.2017.01.011

access: closed

type: Journal Article

metadata version: 2020-02-22

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Yusuke Higashi, Riichiro Takaishi, Koichi Kato, Masamichi Suzuki, Yasushi Nakasaki, Mitsuhiro Tomita, Yuichiro Mitani, Masuaki Matsumoto, Shohei Ogura, Katsuyuki Fukutani, Kikuo Yamabe:
Mechanism of gate dielectric degradation by hydrogen migration from the cathode interface. Microelectron. Reliab. 70: 12-21 (2017)

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