"Comparative study of low-frequency noise in 0.18 μm and 0.35 μm ..."

Chih-Chan Hu et al. (2016)

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DOI: 10.1016/J.MICROREL.2016.02.008

access: closed

type: Journal Article

metadata version: 2020-02-22

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Chih-Chan Hu, Yuan-Fong Chou Chau, Chee Ming Lim, Kuang-Hsiung Tan:
Comparative study of low-frequency noise in 0.18 μm and 0.35 μm gate-length nMOSFETs with gate area of 1.1 μm². Microelectron. Reliab. 60: 10-15 (2016)

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