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"Degradation of RuO2 thin films in hydrogen atmosphere at ..."

Emil V. Jelenkovic et al. (2003)

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DOI: 10.1016/S0026-2714(02)00274-3

access: closed

type: Journal Article

metadata version: 2020-07-30

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Emil V. Jelenkovic, K. Y. Tong, Wai Yuen Cheung, S. P. Wong:
Degradation of RuO₂ thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC. Microelectron. Reliab. 43(1): 49-55 (2003)

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