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"Critical dimension control in photolithography based on the yield by a ..."
H.-Y. Kang, Amy H. I. Lee (2006)
- H.-Y. Kang, Amy H. I. Lee:
Critical dimension control in photolithography based on the yield by a simulation program. Microelectron. Reliab. 46(5-6): 1006-1012 (2006)
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