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"Effective work function of NiSi/HfO2 gate stacks measured with ..."

Yu. Yu. Lebedinskii, A. V. Zenkevich (2007)

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DOI: 10.1016/j.microrel.2007.01.064

access: closed

type: Journal Article

metadata version: 2020-02-22

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Yu. Yu. Lebedinskii, A. V. Zenkevich:
Effective work function of NiSi/HfO₂ gate stacks measured with X-ray photoelectron spectroscopy. Microelectron. Reliab. 47(4-5): 649-652 (2007)

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