"Conduction band states of transition metal (TM) high-k gate dielectrics as ..."

Gerald Lucovsky et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.038

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type: Journal Article

metadata version: 2025-11-09

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Gerald Lucovsky, J. G. Hong, Charles C. Fulton, N. A. Stoute, Y. Zou, Robert J. Nemanich, David E. Aspnes, Harald Ade, D. G. Schlom:
Conduction band states of transition metal (TM) high-k gate dielectrics as determined from X-ray absorption spectra. Microelectron. Reliab. 45(5-6): 827-830 (2005)

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