"Band diagram for low-k/Cu interconnects: The starting point for ..."

Michael J. Mutch et al. (2016)

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DOI: 10.1016/J.MICROREL.2016.04.004

access: closed

type: Journal Article

metadata version: 2020-02-22

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Michael J. Mutch, Thomas Pomorski, Brad C. Bittel, Corey J. Cochrane, Patrick M. Lenahan, Xin Liu, Robert J. Nemanich, Justin Brockman, Marc French, Markus Kuhn, Benjamin French, Sean W. King:
Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability. Microelectron. Reliab. 63: 201-213 (2016)

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