"Electrical characterization of the hafnium oxide prepared by direct ..."

K. L. Ng et al. (2003)

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DOI: 10.1016/S0026-2714(03)00141-0

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mr/NgZKPW03
K. L. Ng, Nian Zhan, Chi-Wah Kok, M. C. Poon, Hei Wong:
Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. Microelectron. Reliab. 43(8): 1289-1293 (2003)

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