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"High-K dielectric deposition in 3D architectures: The case of ..."
L. Pinzelli et al. (2007)
- L. Pinzelli, M. Gros-Jean, Y. Bréchet, F. Volpi, A. Bajolet, J.-C. Giraudin:
High-K dielectric deposition in 3D architectures: The case of Ta2O5 deposited with metal-organic precursor TBTDET. Microelectron. Reliab. 47(4-5): 700-703 (2007)
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