"Implant dose monitoring by MOS C-V measurement."

Roland Sorge (2003)

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DOI: 10.1016/S0026-2714(02)00266-4

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type: Journal Article

metadata version: 2020-02-22

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Roland Sorge:
Implant dose monitoring by MOS C-V measurement. Microelectron. Reliab. 43(1): 167-171 (2003)

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