"Breakdown and latent damage of ultra-thin gate oxides under ESD stress ..."

Jie Wu, Patrick Juliano, Elyse Rosenbaum (2001)

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DOI: 10.1016/S0026-2714(01)00033-6

access: closed

type: Journal Article

metadata version: 2020-02-22

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Jie Wu, Patrick Juliano, Elyse Rosenbaum:
Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions. Microelectron. Reliab. 41(11): 1771-1779 (2001)

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