"A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel."

Seiji Takahashi et al. (2017)

> Home

Details and statistics

DOI: 10.3390/S17122816

access: open

type: Journal Article

metadata version: 2018-11-14

- view
  - electronic edition via DOI (open access)
  authority control:
- export record
  dblp key:
  - journals/sensors/TakahashiHSWGHT17
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/sensors/TakahashiHSWGHT17
Seiji Takahashi, Yi-Min Huang, Jhy-Jyi Sze, Tung-Ting Wu, Fu-Sheng Guo, Wei-Cheng Hsu, Tung-Hsiung Tseng, King Liao, Chin-Chia Kuo, Tzu-Hsiang Chen, Wei-Chieh Chiang, Chun-Hao Chuang, Keng-Yu Chou, Chi-Hsien Chung, Kuo-Yu Chou, Chien-Hsien Tseng, Chuan-Joung Wang, Dun-Nien Yaung:
A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel. Sensors 17(12): 2816 (2017)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.