"Simulation of arsenic in situ doping with polysilicon CVD and its ..."

Clemens Heitzinger et al. (2003)

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DOI: 10.1109/TCAD.2002.807879

access: closed

type: Journal Article

metadata version: 2020-09-24

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Clemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr:
Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 22(3): 285-292 (2003)

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