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"Rigorous three-dimensional photoresist exposure and development simulation ..."
Heinrich Kirchauer, Siegfried Selberherr (1997)
- Heinrich Kirchauer, Siegfried Selberherr:
Rigorous three-dimensional photoresist exposure and development simulation over nonplanar topography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 16(12): 1431-1438 (1997)
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