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"Numerical simulation of the gas immersion laser doping (GILD) process in ..."

Ettore Landi, Paul G. Carey, Thomas W. Sigmon (1988)

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DOI: 10.1109/43.3150

access: closed

type: Journal Article

metadata version: 2020-09-24

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Ettore Landi, Paul G. Carey, Thomas W. Sigmon:
Numerical simulation of the gas immersion laser doping (GILD) process in silicon. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 7(2): 205-214 (1988)

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