Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Modeling of a plasma processing machine for semiconductor wafer etching ..."

Fathi M. A. Salam et al. (1997)

> Home

Details and statistics

DOI: 10.1109/87.641404

access: closed

type: Journal Article

metadata version: 2020-06-08

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tcst/SalamPEGA97
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tcst/SalamPEGA97
Fathi M. A. Salam, Christian Piwek, Gamze Erten, Timothy A. Grotjohn, Jes Asmussen:
Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks. IEEE Trans. Control. Syst. Technol. 5(6): 598-613 (1997)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.