"Design and Topology Optimization of a Novel Normal-Stressed ..."

Dongpo Zhao et al. (2025)

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DOI: 10.1109/TIE.2025.3561834

access: closed

type: Journal Article

metadata version: 2025-11-09

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Dongpo Zhao, Li Chen, Zi-Hui Zhu, Wen Wang, Hanheng Du:
Design and Topology Optimization of a Novel Normal-Stressed Electromagnetic XY Nanopositioning Stage. IEEE Trans. Ind. Electron. 72(11): 11120-11129 (2025)

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