"Enhancing Measurement Accuracy of Nanolithography Alignment Using 2-D ..."

Feifan Xu, Haojie Xia (2025)

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DOI: 10.1109/TIM.2025.3600709

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type: Journal Article

metadata version: 2025-10-15

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Feifan Xu, Haojie Xia:
Enhancing Measurement Accuracy of Nanolithography Alignment Using 2-D Hamming Self-Convolution Window. IEEE Trans. Instrum. Meas. 74: 1-13 (2025)

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