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S. G. Mhaisalkar

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2000 – 2009

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2006
[j3]
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Hung Son Nguyen, Z. H. Gan, Zhe Chen, V. Chandrasekar, K. Prasad, S. G. Mhaisalkar, Ning Jiang:
Reliability studies of barrier layers for Cu/PAE low-k interconnects. Microelectron. Reliab. 46(8): 1309-1314 (2006)
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M. Y. Yan, King-Ning Tu, A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy:
A direct measurement of electromigration induced drift velocity in Cu dual damascene interconnects. Microelectron. Reliab. 46(8): 1392-1395 (2006)
2004
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A. V. Vairagar, S. G. Mhaisalkar, Ahila Krishnamoorthy:
Electromigration behavior of dual-damascene Cu interconnects--Structure, width, and length dependences. Microelectron. Reliab. 44(5): 747-754 (2004)

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