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Yoshinao Harada

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Journal Articles

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2001
[j2]
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Koji Eriguchi, Yoshinao Harada, Masaaki Niwa:
Effects of base layer thickness on reliability of CVD Si₃N₄ stack gate dielectrics. Microelectron. Reliab. 41(4): 587-595 (2001)
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Takayuki Yamada, Masaru Moriwaki, Yoshinao Harada, Shinji Fujii, Koji Eriguchi:
Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. Microelectron. Reliab. 41(5): 697-704 (2001)

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