Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Plasma-Enhanced Combustion-Processed Al2O3 Gate Oxide for In2O3 Thin Film ..."

Qihan Liu et al. (2019)

> Home

Details and statistics

DOI: 10.1109/ICICDT.2019.8790939

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-19

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/icicdt/LiuZZMHXYLWWC19
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/icicdt/LiuZZMHXYLWWC19
Qihan Liu, Chun Zhao, Cezhou Zhao, Ivona Z. Mitrovic, Stephen Hall, Wangying Xu, Li Yang, Eng Gee Lim, Q. N. Wang, Y. L. Wei, Yixin Cao:
Plasma-Enhanced Combustion-Processed Al2O3 Gate Oxide for In2O3 Thin Film Transistors. ICICDT 2019: 1-5

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.