"Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D ..."

Yusuke Higashi et al. (2024)

> Home

Details and statistics

DOI: 10.1109/IRPS48228.2024.10529409

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-29

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/HigashiBCBARRJBR24
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/HigashiBCBARRJBR24
Yusuke Higashi, J. P. Bastos, Adrian Vaisman Chasin, Laurent Breuil, Antonio Arreghini, S. Ramesh, S. Rachidi, Y. Jeong, Geert Van den Bosch, Maarten Rosmeulen:
Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and Endurance. IRPS 2024: 1-6

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.