"Modeling of NBTI Stress Induced Hole-Trapping and ..."

Chenyue Ma et al. (2013)

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DOI: 10.1587/TRANSELE.E96.C.1339

access: closed

type: Journal Article

metadata version: 2025-03-03

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Chenyue Ma, Hans Jürgen Mattausch, Masataka Miyake, Takahiro Iizuka, Kazuya Matsuzawa, Seiichiro Yamaguchi, Teruhiko Hoshida, Akinori Kinoshita, Takahiko Arakawa, Jin He, Mitiko Miura-Mattausch:
Modeling of NBTI Stress Induced Hole-Trapping and Interface-State-Generation Mechanisms under a Wide Range of Bias Conditions. IEICE Trans. Electron. 96-C(10): 1339-1347 (2013)

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