"Full-chip leakage analysis for 65 nm CMOS technology and beyond."

Jiying Xue et al. (2010)

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DOI: 10.1016/J.VLSI.2010.05.002

access: closed

type: Journal Article

metadata version: 2020-02-20

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Jiying Xue, Tao Li, Yangdong Deng, Zhiping Yu:
Full-chip leakage analysis for 65 nm CMOS technology and beyond. Integr. 43(4): 353-364 (2010)

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