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"Physical properties and electrical characteristics of H2O-based ..."
Jibin Fan et al. (2012)
- Jibin Fan, Hongxia Liu, Qianwei Kuang, Bo Gao, Fei Ma, Yue Hao:
Physical properties and electrical characteristics of H2O-based and O3-based HfO2 films deposited by ALD. Microelectron. Reliab. 52(6): 1043-1049 (2012)
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