"Time-dependent dielectric breakdown of SiO2 films in a wide ..."

Akinobu Teramoto et al. (2001)

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DOI: 10.1016/S0026-2714(00)00095-0

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type: Journal Article

metadata version: 2023-10-27

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Akinobu Teramoto, H. Umeda, K. Azamawari, Kiyoteru Kobayashi, K. Shiga, J. Komori, Y. Ohno, A. Shigetomi:
Time-dependent dielectric breakdown of SiO₂ films in a wide electric field range. Microelectron. Reliab. 41(1): 47-52 (2001)

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