"Optimal phase conflict removal for layout of dark field alternatingphase ..."

Piotr Berman et al. (2000)

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DOI: 10.1109/43.828546

access: closed

type: Journal Article

metadata version: 2020-09-24

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Piotr Berman, Andrew B. Kahng, Devendra Vidhani, Huijuan Wang, Alexander Zelikovsky:
Optimal phase conflict removal for layout of dark field alternatingphase shifting masks. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 19(2): 175-187 (2000)

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