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"EBL Overlapping Aware Stencil Planning for MCC System."

Bei Yu et al. (2016)

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DOI: 10.1145/2888394

access: closed

type: Journal Article

metadata version: 2018-11-06

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  - https://dblp.org/rec/journals/todaes/YuYGHP16
Bei Yu, Kun Yuan, Jhih-Rong Gao, Shiyan Hu, David Z. Pan:
EBL Overlapping Aware Stencil Planning for MCC System. ACM Trans. Design Autom. Electr. Syst. 21(3): 43:1-43:24 (2016)

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