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"Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 ..."

L. Panarella et al. (2023)

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DOI: 10.1109/IRPS48203.2023.10117803

access: closed

type: Conference or Workshop Paper

metadata version: 2023-05-24

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  dblp key:
  - conf/irps/PanarellaKSVSCLTARKA23
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  - https://dblp.org/rec/conf/irps/PanarellaKSVSCLTARKA23
L. Panarella, Ben Kaczer, Quentin Smets, Devin Verreck, Tom Schram, Daire Cott, Dennis Lin, Stanislav Tyaginov, I. Asselberghs, Cesar J. Lockhart de la Rosa, Gouri Sankar Kar, Valeri Afanas'ev:
Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs. IRPS 2023: 1-6

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