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"High quality silicon nitride deposited by ..."
Chuan Jie Zhong et al. (2006)
- Chuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro Ohmi:
High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature. Microelectron. J. 37(1): 44-49 (2006)
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