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"Comparison of metal gate electrodes on MOCVD HfO2."
Max Christian Lemme et al. (2005)
- Max Christian Lemme, J. K. Efavi, H. D. B. Gottlob, Thomas Mollenhauer, Thorsten Wahlbrink, Heinrich Kurz:
Comparison of metal gate electrodes on MOCVD HfO2. Microelectron. Reliab. 45(5-6): 953-956 (2005)
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