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Robert J. Nemanich

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Journal Articles

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2016
[j2]
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  dblp key:
  - journals/mr/MutchPBCLLNBFKF16
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  persistent URL:
  - https://dblp.org/rec/journals/mr/MutchPBCLLNBFKF16
Michael J. Mutch, Thomas Pomorski, Brad C. Bittel, Corey J. Cochrane, Patrick M. Lenahan, Xin Liu, Robert J. Nemanich, Justin Brockman, Marc French, Markus Kuhn, Benjamin French, Sean W. King:
Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability. Microelectron. Reliab. 63: 201-213 (2016)
2005
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  - journals/mr/LucovskyHFSZNAAS05
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Gerald Lucovsky, J. G. Hong, Charles C. Fulton, N. A. Stoute, Y. Zou, Robert J. Nemanich, David E. Aspnes, H. Ade, D. G. Schlom:
Conduction band states of transition metal (TM) high-k gate dielectrics as determined from X-ray absorption spectra. Microelectron. Reliab. 45(5-6): 827-830 (2005)

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